Difference between revisions of "TF Scratch"
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+ | TJP: Assoc in electonics | ||
+ | |||
D_C: already interviewed (2nd) | D_C: already interviewed (2nd) | ||
G_D: Interviewed before (3rd) | G_D: Interviewed before (3rd) | ||
+ | |||
+ | PWP: Electrical Engineer | ||
JRN: BS physics 2010 | JRN: BS physics 2010 | ||
− | + | PEA: microbiology | |
− | |||
MDG: 14 years at Intel | MDG: 14 years at Intel | ||
− | + | JRB: CoT 2003 in laer optics, | |
− | |||
− | |||
− | |||
--- | --- |
Revision as of 22:26, 13 January 2012
TJP: Assoc in electonics
D_C: already interviewed (2nd)
G_D: Interviewed before (3rd)
PWP: Electrical Engineer
JRN: BS physics 2010
PEA: microbiology
MDG: 14 years at Intel
JRB: CoT 2003 in laer optics,
---
ADJ: Graduated as Electrical Tech in 2011, may have trouble focusing on feedthrough
BDB: Electronics, May have trouble focusing
BMP: Associates in Electromech tech, last 10 years at Intel in lithography
CWS: May have trouble focusing on feedthrough
CAE: EE, may have trouble focusing
CJS: Biology,
DBK: trouble focusing
DCP: Trouble focusing
DKI: Trouble focusing
JSH: trouble focusing, micron 1991-2006
JBP: Trouble focusing
LDM: Trouble focusing
L_G: trouble focusing
MBC: trespassing, welder,
M_D: trouble focusing
RLM: trouble focusing
RJM: trouble focusing
RJM2: trouble focusing
RJB: trouble focusing
RJK: trouble focusing
SMH: bilogy, manual laborer
SJP: trouble focusing
TMH: trouble focusing